MoSi2 is used for the heating element of the ceramic heater. Even at the high temperature of 1,700℃, it has maintains good oxidation resistance by the formation of protective membrane on the surface. TiSi2, CrSi2 can produce an oxidation-resistant surface in a low pressure plasma spraying thanks to its relatively low melting point. Highly-Pure products, MoSi2, WSi2, and TaSi2, are important materials as PVD target for semiconductor-related applications. In recent years FeSi2 has become the remarkable as high temperature thermoelectric material.